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IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

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China Changzhou Junhe Technology Stock Co.,Ltd certification
China Changzhou Junhe Technology Stock Co.,Ltd certification
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IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance IT Industry Silicon Wafer Cleaning With Good Degreasing Performance IT Industry Silicon Wafer Cleaning With Good Degreasing Performance IT Industry Silicon Wafer Cleaning With Good Degreasing Performance IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

Large Image :  IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

Product Details:
Place of Origin: Changzhou in china
Brand Name: JUNHE
Certification: ISO9001 TS16949 SGS
Model Number: 1020
Payment & Shipping Terms:
Minimum Order Quantity: 500 Kilograms
Price: Negotiable
Packaging Details: 1000kg/barrel
Delivery Time: Ten days after receipt of advance payment
Supply Ability: 2 Tons per Day

IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

Description
Name: Silicon Wafer Cleaning Application: IT Industry
PH: 12.0-14.0 Free Alkalinity(piont): ≧13.5mg
Name: Si Wafer Cleaning Model: 1020
High Light:

Silicon Slice Detergent

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Industrial Chemical Cleaning

IT Industry Silicon Wafer Cleaning With Good Degreasing Performance

 

The RCA clean process is based on a cleaning method developed at RCA Corporation to remove organic residue from silicon wafers. The cleaning solution is made up of 5 parts water, 1 part 27% ammonium hydroxide and 1 part 30% hydrogen peroxide. It removes organic contaminants and leaves a thin layer of oxidized silicon on the surface of the wafer.

 

Silicon Wafer Cleaning feature

 

1) single group products with perfect PPR(performance price ratio)

2) be free from calcium, magnesium, metal, copper, lead and phosphor, and meet the requirement of ROHS.

3)good degreasing performance to meet the requirement of high-accuracy IT area.

 

Silicon Wafer Cleaning technical parameter

 

classification

project

JH-1020 Silicon Wafer Cleaning Test Standard
Appearance Colorless to yellowish liquid visualization
Specific weight 1.01-1.25 densimeter
pH 12.0-14.0 PH instrument
free alkalinity(piont) ≧13.5mg CYFC

 

Silicon Wafer Cleaning instructions

 

1) put pure water into cleaning tank till three-quarter, then, add agent in 3% -5% concentration, add water till working level, last, heat the bath solution till working temperature.

2) need to change bath solution completely after degreasing certain amount silicon slice.

3)  reduce exposed time in air to avoid oxidation.

4) working temperature 50-65 degree, disposal time: 2-5minutes.

 

 

 

IT Industry Silicon Wafer Cleaning With Good Degreasing Performance 0

 

Contact Details
Changzhou Junhe Technology Stock Co.,Ltd

Contact Person: kyjiang

Tel: +8613915018025

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