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Product Details:
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| Color: | Colorless To Yellowish Liquid | Specific Weight: | 1.01-1.25 |
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| PH: | 12.0-14.0 | Free Alkalinity(piont): | ≧13.5mg |
| Name: | Silicon Wafer Cleaning | Origin: | Changzhou In China |
| Highlight: | Silicon Slice Detergent,Industrial Chemical Cleaning |
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Solar Grade Ultrasonic Cleaning Chemicals , Silicon Degreasing Agent
Ultrasonic Cleaning Chemicals Introduction
One of the largest challenges faced in the semiconductor manufacturing industry is the surface contamination of silicon wafers. Most commonly, silicon wafers become contaminated simply from exposure to the air, which contains a high degree of organic particle contaminants. These contaminants strongly bond to the silicon wafer surface due to a strong electrostatic force, creating a lot of headache for those in the semiconductor manufacturing industry.
In order to function properly, silicon wafers must be completely free of any contaminants. Removing these contaminants is not the simplest of tasks, however, as silicon wafers are very fragile. For this reason, semiconductor manufacturing businesses must adhere to a carefully formulated cleaning plan that ensures the wafer surfaces are returned to a clean state while maintaining minimal risk of damage.
Ultrasonic Cleaning Chemicals feature
1 single group products with perfect PPR(performance price ratio)
2 low foam, no foam overflow in ultrasonic cleaning.
3. good degreasing performance to meet the requirement of high-accuracy IT area.
Ultrasonic Cleaning Chemicals technical parameter
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classification project |
JH-1016 Ultrasonic Cleaning Chemicals | Test Standard |
| Appearance | Colorless to yellowish liquid | visualization |
| Specific weight | 1.01-1.25 | densimeter |
| pH | 12.0-14.0 | PH instrument |
| free alkalinity(piont) | ≧13.5mg | CYFC |
Ultrasonic Cleaning Chemicals instructions
1) put pure water into cleaning tank till three-quarter, then, add agent in 3% concentration, add water till working level, last, heat the bath solution till working temperature.
2)need to change bath solution completely after degreasing certain amount silicon slice.
3) reduce exposed time in air to avoid oxidation.
4)working temperature 50-65 degree, disposal time: 2-5minutes.
About US
Changzhou Junhe Technology Stock Co., Ltd. is a high-tech enterprise devoted to developing industrial fine chemicals, special equipment and services solution provider which was founded in Changzhou, Jiangsu in 1998.
Zinc flake microlayer corrosion protection coating is one of our core products, our company draw on the experience and lesson of dacromet coating technology from Japan and USA, investing millions on R&D, after 20 years application and diffusion, Junhe zinc flake microlayer corrosion protection coating already become one of the leading brand in China.
Our company have three industrial base: chemical production base, equipment production base, coating job processing base.
Contact Person: Mrs. June
Tel: +86 13915018025
Fax: 86-519-85913023
