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Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

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China Changzhou Junhe Technology Stock Co.,Ltd certification
China Changzhou Junhe Technology Stock Co.,Ltd certification
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Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam
Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam
Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

Large Image :  Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

Product Details:
Place of Origin: Changzhou in China
Brand Name: JUNHE
Certification: ISO9001 CE ROHS
Model Number: JH-216
Payment & Shipping Terms:
Minimum Order Quantity: 100 Kilograms
Price: Negotiable
Packaging Details: 1000kg/barrel,25kg/plastic drum
Delivery Time: Ten days after receipt of advance payment
Payment Terms: L/C, T/T
Supply Ability: 2 Tons per Day

Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

Description
Color: Colorless To Yellowish Liquid Proportion: 1.15-1.25
PH: ≥14 Free Alkalinity: 300-400
High Light:

Industrial Chemical Cleaning

,

Ultrasonic Cleaning Chemicals

 

JH-216 High concentration of two components named Silicon Slice Detergent ​ph≥14 Specific weight 1.15-1.25

 

1. Brief

 

This is patent products for degreasing electron level and solar grade silicon slice in IT and solar battery area, and the patent number is ZL200710020269.6. The product contain double group with good performance in emulsion saponifiation edulcoration to tallowvegetable oilmineral oilsoliquiodgrinding past , also in stripingcomplexing edulcoration to metal ion.

 

2. Key feature

 

1) double group products with perfect PPR(performance price ratio),Especially suitable for cleaning heavily polluted wafers.

 

2) be free from calcium, magnesium, metal, copper, lead and phosphor, and meet the requirement of ROHS.

 

3) low foam, no foam overflow in ultrasonic cleaning and friendly to the environment.

 

4) good degreasing performance to meet the requirement of high-accuracy IT area in Asian countrys.

 

3. Technical parameter

 

lassification

project

JH-216 Test Standard  
 
Appearance Colorless to yellowish liquid visualization  
Specific weight 1.15-1.25 densimeter  
pH ≥14 PH instrument  
free alkalinity(piont) 300-400 CYFC

 

4. Instructions

 

1) put pure water into cleaning tank till three-quarter, then, add agent in 3% -8% concentration, add water till working level, last, heat the bath solution till working temperature.

 

2) need to change bath solution completely after degreasing certain amount silicon slice.

 

3) reduce exposed time in air to avoid oxidation.

 

4) working temperature degree in needed, disposal time: 2-5minutes.

 

 

5. Notes

 

1. The ingot after wire cutting should not be stained with water. If it cannot be cleaned in time, it is best to store it in suspension or cleaning agent (all immersed).


2. Once the wire rod is cut, it must be disposed of immediately. Moreover, the silicon wafer should not be allowed to dry naturally throughout the cleaning process.


3. The silicon wafer must be kept wet when degumming, and it should not be dried naturally.

 

6. Additions

 

1) packing:20kg/carton(2kg/bottle),25kg/plastic barrel, 1000kg/barrel

 

2) validity time: one year

 

Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam 0

 

Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam 1

Contact Details
Changzhou Junhe Technology Stock Co.,Ltd

Contact Person: Mrs. June

Tel: +86 13915018025

Fax: 86-519-85913023

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